Santosh Shaw, a PhD student in materials science and engineering, was recently awarded a 2016 Optics and Photonics Education Scholarship by SPIE, the international society for optics and photonics. Shaw was recognized for his potential contributions to the field of optics, photonics, or other light-based science.
Working with MSE Assistant Professor Ludovico Cademartiri, Shaw’s research focus includes developing optics-free lithography for 5nm features and exploiting plasmas as a manufacturing tool. He is one of the members of Cademartiri’s lab focusing on the development of large-scale superhydrophobic (water-repellent) surface coatings. Shaw has also made significant contribution to the research on building materials with a designed microstructure from the bottom-up, clarifying the long-standing debate on inverse Hall-Petch behavior.
Shaw has authored or co-authored seven publications, including in Advanced Materials (inside cover article) and Chemical Communication. He has also produced three invention disclosures.
SPIE is an educational not-for-profit organization founded in 1955 to advance light-based science, engineering, and technology. Through 2015, SPIE has distributed $5 million in individual scholarships, reflecting their commitment to education and to the next generation of optical scientists and engineers around the world.
For more information on SPIE and its scholarship program, please visit the SPIE website.